JPR-Series

It is used in PhotoResist Strip process during semiconductor processing. It has excellent effect on removal of PR and organic matters and does not cause environmental problems such as halogen use.

JPR-Series

Photoresist stripper

It is used in PhotoResist Strip process during semiconductor processing. It has excellent effect on removal of PR and organic matters and does not cause environmental problems such as halogen use.

Features

  • The removal rate of PR is superior to conventional solvents.
  • There is no residue after PR removal, and it has excellent cleaning power during washing process.
  • It does not affect the material at all.
  • Both positive and negative PR are applicable.
  • Under-cut phenomenon does not occur due to excellent dissolving power.
  • Longer life than conventional solvents.

Specification

Appearancelight yellow transparent
OdorOdorless
pH(1:1)11.5 ± 0.5
Specific Gravity(g/㎖)1.05 ± 0.02
Concentrationuse undiluted solution
Temperature40 ~ 80℃
How it worksImmersion / immersion ultrasound
Packaging20㎏ (pail) / 200㎏ (drum)

Application Examples

  • Etching of fine patterns such as LCD, PCB, Semiconductor
  • Car muffler
  • Car muffler